"Mikro- und Nanotechnologie"

Course Category
Lecture and Tutorial

Grundstudium / Bachelor

Hauptstudium / Master

SemesterWinter Semester
Creditpoints5 CP

Course Goal

The aim of the lecture is to impart knowledge about processes and equipment for the production of micro components in thin film technology. The focus is on technologies for the fabrication of these components in a wafer process called "Frontend Process". The microcomponents are manufactured by using coating, etching and doping techniques in combination with photolithography.

Course Content

  • Basics of vacuum technology
  • Coating Technology
    • Physical Vapor Deposition (PVD) and chemical (Chemical Vapor Deposition - CVD) deposition of films from gas phase
    • Galvanic processes
  • Doping and surface transformation
  • Etching Technology
    • Wet chemical etching
    • Physical, physical-chemical and chemical dry etching
  • Photolithographic methods for structure definition
  • Production in clean room
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