Minimizing Oxygen Inclusion when Electroplating High Saturation Density CoFe for Microelectromechanical System
| Categories |
Zeitschriften/Aufsätze |
| Year | 2010 |
| Authors | J. Chen, E. Flick, H.H. Gatzen |
| Published in | Journal of Applied Physics 107, Issue 9, pp. 09A311-09A311-3, 2010 |
