ResearchPublications
Minimizing Oxygen Inclusion when Electroplating High Saturation Density CoFe for Microelectromechanical System

Minimizing Oxygen Inclusion when Electroplating High Saturation Density CoFe for Microelectromechanical System

Categories Zeitschriften/Aufsätze
Year 2010
Authors J. Chen, E. Flick, H.H. Gatzen
Published In Journal of Applied Physics 107, Issue 9, pp. 09A311-09A311-3, 2010