ForschungPublikationen
Application of UV Depth Lithography and 3D-Microforming for High Aspect Ratio Electromagnetic Microactuator Components

Application of UV Depth Lithography and 3D-Microforming for High Aspect Ratio Electromagnetic Microactuator Components

Kategorien Zeitschriften/Aufsätze
Jahr 2002
Autoren T. Kohlmeier, V. Seidemann, S. Büttgenbach H.H. Gatzen
Veröffentlicht in Microsystem Technologies, Springer Verlag Berlin Heidelberg New York, Vol. 8, No.4-5, pp. 304-307