ForschungPublikationen
Non-reactive and reactive ion etching processes for patterning magnetic MEMS components

Non-reactive and reactive ion etching processes for patterning magnetic MEMS components

Kategorien Konferenz (reviewed)
Jahr 2003
Autoren M. Balke, H. Lüthje, T. Budde, H.H. Gatzen, G. Bräuer
Veröffentlicht in Proc. of the 2nd MICRO.tec Conf. 2003, Munich, pp. 51-52