Minimizing Oxygen Inclusion when Electroplating High Saturation Density CoFe for Microelectromechanical System
| Kategorien |
Zeitschriften/Aufsätze |
| Jahr | 2010 |
| Autoren | J. Chen, E. Flick, H.H. Gatzen |
| Veröffentlicht in | Journal of Applied Physics 107, Issue 9, pp. 09A311-09A311-3, 2010 |
