ForschungPublikationen
Minimizing Oxygen Inclusion when Electroplating High Saturation Density CoFe for Microelectromechanical System

Minimizing Oxygen Inclusion when Electroplating High Saturation Density CoFe for Microelectromechanical System

Kategorien Zeitschriften/Aufsätze
Jahr 2010
Autoren J. Chen, E. Flick, H.H. Gatzen
Veröffentlicht in Journal of Applied Physics 107, Issue 9, pp. 09A311-09A311-3, 2010